直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。

Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.

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探讨了与气体流动等条件相结合，用预电离方法实现大气压下空气中辉光放电的可能性。

By using of the preionization combined with the gas flow or other methods, the probability of obtaining atmosphere glow discharges in air is discussed, too.

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讨论了高频辉光放电等离子体系统中绝缘衬底表面的自负偏压问题，用等效电路方法给出了自负偏压的数学解析。

Selfnegative bias on insulate substrate surface of rf glow discharge plasma reactors is studied theoretically. The mathematical analysis has been obtained by equivalent circuit method.

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