本发明能够在晶片表面形成均匀的扩散源涂层。
The invention is capable of forming an even spread source coat on the surface of the wafer.
然而，在动态的反应环境中在镁表面制备铝扩散涂层的研究并未见报道。
However, there is no study on the fabricating Al diffusion coating in a dynamics environment yet.
文章还介绍了为预防汽轮机喷嘴和动叶片免受固体颗粒侵蚀所采用的表面硬化处理技术，包括等离子喷涂层和扩散渗层在内；
The paper also briefs the nozzle or moving blade surface hardening treatment technology, including plasma spraying and diffusion layer for preventing the nozzle and moving blade from SPE.
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