左图是一套Applied Tetra III高级掩膜蚀刻系统，如果掩膜板制造商要开发和生产45纳米的掩膜，就必须得使用这套设备。
On the left is an Applied Tetra III advanced reticle-etch system. This system is used by virtually every maskmaker in the world for the development and production of 45-nanometer masks.
在批量蚀刻前是否进行首件与确认蚀刻机设备与线径？
Is a first article run prior to etching the lot to confirm etcher Settings and linewidths?
介绍了激光蚀刻、书写设备中的图形输入方法，着重讨论了图像预处理、直线段识别和圆弧识别的数学方法。
The method for the graphic input in a laser-induced thermal etching system and writing device is described.
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