用高能量密度脉冲等离子体于室温下在氮化硅陶瓷刀具上成功沉积了高硬耐磨的氮化钛涂层。
Hard and wear-resistant titanium nitride coatings were deposited by pulsed high energy density plasma technique on silicon nitride ceramic cutting tools at ambient temperature.
超短脉冲激光照射固体靶时可将其能量在极短的时间内沉积在靶表面一个极小的空间范围内，在固体靶表面产生固体密度的等离子体。
Differing from the long pulse laser the ultra short laser will deposit its energy on the surface of the solid target in very short time and produce solid dense plasmas.
在薄膜沉积和离子束刻蚀技术中，通常要给绝缘基片加上一个射频或脉冲电极，以便在绝缘基片上形成一个自偏压来控制轰击到绝缘基片表面的离子能量。
Self-bias voltage of the dielectric substrate surface and voltage of the driven electrode were experimentally studied to improve the energy control of impinging ion in plasma processes.
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