实验结果表明：镀CH膜是增加激光能量注入率、提高腔靶辐射温度的有效方法。
The experimental results show that CH plating hole targets have higher laser energy injection efficiency.
实验结果表明：相同参数条件下半腔靶与孔靶相比，激光能量注入率减少约10%。
The experimental results show that under the same conditions the laser energy injection efficiencies for half-cavity targets are 10 percent lower than those for hole targets.
随着注入离子的能量和剂量提高，染色体畸变细胞率呈增加趋势。
The rate of cells with chromosome aberration was increased with the increase of ion beam energy and dose.
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