通过纳米制备技术研究者在氮化硅中刻蚀出许多空洞以构成所需图案，使得波导具有合适的隐形折射率。
Using nanofabrication techniques, the researchers etched tiny holes into the nitride to make a desired pattern, giving the waveguide the cloaking refractive index profile.
本文提出了一种基于“沾笔”纳米刻蚀和电化学还原技术在表面上制备金属及半导体纳米结构的普适性方法。
A general approach for fabricating metallic and semiconducting nanostructures has been developed based on "dip pen" nanolithography combined with electrochemical reduction of water soluble salts.
模拟结果为用PS球刻蚀技术制备金属纳米孔阵列的实验提供了理论支持。
The simulation results provide a theoretic guide for the fabrication of metallic nano-hole array by PS sphere's etching and vacuum depositing technology.
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