利用磁控溅射离子镀技术在屈强比不同的45钢及40Cr钢基体上制备Cr、类石墨碳(Graphite-like-carbon,GLC)及CrTiAlN微纳米梯度镀层,通过考察镀层/金 ..
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采用电弧离子镀膜方法，以高纯石墨为碳离子源在PM MA树脂义齿表面沉积类金刚石膜。
By the technology of vacuum cathodic arc deposition, graphite as cathode, Diamond like carbon film (DLC) was deposited on PMMA resin denture.
利用非平衡磁控溅射技术在单晶硅基底上沉积了类石墨非晶碳膜。
Graphitelike carbon film was deposited on silicon substrates by unbalanced magnetron sputtering.
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