利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。

The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.

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采用四极质谱仪测量了试验参数对高压脉冲增强射频磁控溅射ptfe靶等离子体气氛的影响规律。

Quadrupole mass spectrometer was used to analyze the plasma environment of RF magnetron sputtering PTFE target with pulsed bias.

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