采用感应耦合等离子体刻蚀技术实现了不同形状和几何参数的规则织构化硅片表面的构筑与制备。
Regular textured silicon surfaces with various shape and different geometrical parameters were successfully designed and prepared using inductively coupled plasma (ICP) etching technology.
提出一种基于等离子体刻蚀的技术，形成减反射表面结构。
A technology based on plasma etching has been developed to produce antireflective surface structures.
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