本文介绍微波等离子体刻蚀应用的实验结果。
In this paper, the result of etching application with microwave plasma will be introduced.
提出一种基于等离子体刻蚀的技术，形成减反射表面结构。
A technology based on plasma etching has been developed to produce antireflective surface structures.
因此，等离子体刻蚀的各向异性可以通过增加射频频率和射频功率来改善。
Therefore, plasma etching anisotropy can be improved by increasing rf frequency or rf-bias power.
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