这是一个复杂的过程，在充满微粒子的真空环境下对产品进行离子溅镀，以在产品表面形成保护层。
It is a sophisticated process, performed under vacuum which deposits microscopic particles on the products by ion bombing or sputtering, to form a protecting coating on their surface.
本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.
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