掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
此外，用此方法提取的电子散射参数被成功地用于相同实验条件下的电子束临近效应校正。
Furthermore, the parameters acquired by this method are successfully used for proximity effect correction in electron beam lithography on the same experimental conditions.
使用相对论性强激光与电子束对撞中产生的辐射研究非线性康普顿散射是粒子物理与强激光物理两个领域的交叉前沿课题。
Using the collision of relativistic laser and electron beam to study the nonlinear Compton scattering is the interdisciplinary frontier of particle physics and strong laser physics.
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