同时还介绍了电子束光刻技术及其改进。
The electron beam lithography and its improvement are introduced also.
利用电子束光刻技术制作了基于钛酸钠纳米线的纳米器件。
Individual sodium titanate nanowire-based device is fabricated via e-beam lithography techniques.
因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。
E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.
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