考察了工艺参数对薄膜质量的影响，对薄膜的表面形貌，薄膜的生长速率以及热处理与薄膜的成相及其电阻率的关系进行了观察和分析。
The effects of the technological parameters on the quality of the films were studied. The growth rate and surface morphology of the films with cycle times were characterized.
在该模型中，我们考虑了沉积速率、沉积温度以及沉积角度等影响薄膜生长的参数。
By simulation of thin films growth, some microscopic processes can be revealed in extreme condition, such as high temperature and high deposition rate.
再根据晶体大小分布理论（CSD），计算出斜长石的晶体生长速率、成核密度及成核速率等岩浆结晶动力学参数；
On the basis of the crystal size distribution (CSD) theory, the growth rates, nucleation density and nucleation rates of plagioclase have been worked out.
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