本文介绍了利用特征矩阵法进行薄膜设计的制作方法。
This paper presents a fabrication method which USES Eigen Matrix method to conduct film design.
简要的叙述了光学薄膜光学特性的通用计算方法，即特征矩阵法。
A general calculating method of optical character of optical thin films, namely characteristic matrix method is stated concisely.
用特征矩阵法研究了窄带缺陷模在入射角缓慢变化中的变化规律。
The change of narrow defect mode under gradual changes of incident Angle is studied by use of eigen matrix.
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