源气体及组分的选择是硅槽刻蚀技术的关键因素。
Correct selection of source gases and their compositions is one of the critical factors for si trench etching.
我们主要考虑的不同气源条件为：源气体的选择、电压、源气的湿度。
The condition of different gas source considered for us includes selecting of source gas, work voltage and humidity of source gas.
本阀门适用于气相色谱仪或其它仪器调节载气、辅助气和其它气源气体流量的大小。
The valve for gas chromatography or other instruments to adjust the carrier gas, auxiliary gas and other gas source gas flow size.
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