采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
用热等静压法烧结制备了高导电性ZAO（铝掺杂氧化锌）陶瓷靶材，并用直流磁控溅射法制备出ZAO透明导电薄膜。
Aluminum-doped zinc oxide (ZAO) ceramic targets for sputtering were fabricated by hot isostatic pressing (HIP) and ZAO transparent conducting thin films were prepared by dc magnetron sputtering.
利用x射线衍射法对铜—锌和铜—锌—铝系低压合成甲醇催化剂还原态的结晶铜和氧化锌晶格畸变进行测定。
The crystal copper and distorted zinc oxide lattice of reduced low-pressure synthetic catalyst of methanol are studied with XRD.
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