锌(IZO)、氧化铟锡锌(ITZO) 或其混合物的材料来沉积第一透明电极层124a ；并且可以通 过利用PECVD 或CVD 沉积无机材料来形成第三保护膜136a。
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本文采用射频辅助脉冲激光沉积(PLD)系统，在镀有透明导电膜氧化锡铟(ito)的玻璃衬底上制备了氧化锌薄膜。
Zinc oxide thin films were prepared by pulsed laser deposition (PLD) on glass substrates coated with tin-doped indium oxide (ITO) thin films in this paper.
采用本发明的氧化锌透明电极取代传统的氧化铟锡透明电极，简化了制备工艺，降低了成本。
With the traditional tin indium oxide transparent electrode replaced by the zinc oxide transparent electrode of the invention, the manufacturing process is simplified and cost is lowered.
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