实验结果表明：退火后样品的薄膜电阻率显著减小，是未退火样品薄膜电阻率的3.17分之一；

The experimental results indicated that the film resistivity of the sample annealed was reduced significantly and only one 3.17 of the unannealed.

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XRD结构分析显示，退火后薄膜样品的峰值强度大于未退火样品的强度，说明样品结晶度增强。

XRD structural analysis shows that peak intensity of the annealed sample is greater than that of the unannealed one which demonstrated an increase of crystallinity.

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