本文采用交替施加高偏压和低偏压的方法，合成出了具有软膜和硬膜结构的无氢类金刚石多层膜。
Using an alternating high- and low-bias voltage, we have formed hydrogen-free multilayers of hard and soft diamond-like carbon films.
利用新型中频对靶磁控溅射在硅和M2高速钢基体上沉积了一系列无氢含铬类金刚石膜。
The hydrogen-free diamond-like carbon(DLC) films were deposited on substrates of Si and M2 high-speed steel using a new mid-frequency dual-magnetron sputtering.
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