... mask lifetime 掩模寿命 mask lithography 掩模光刻 mask making facilities 掩模制造设备 ...
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LDD和SOI结构； 移相掩模光刻技术和多层金属布线工艺。
The short channel effects , the structure of LDD and SOI, phaseshift mask and multilevel interconnection were included.
氧化物、掩模或标线的不透明区域，或光刻层中不需要的小孔。
A small undesired hole in an oxide opaque region of a mask or reticle or in a photoresist layer.
对于要求同时检测矩形或接近矩形槽形的全息光刻胶光栅掩模的槽深和占宽比，该方法完全适用。
The method is qualified for measurement of groove depth and duty cycle simultaneously for the rectangle-shaped or similar profile of holographic grating mask.
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