列举了几种多晶硅高温压力传感器的热灵敏度漂移补偿方法，并分别讨论了它们的原理及特点。
Several compensation methods of thermal sensitivity shift of polysilicon pressure sensor are introduced, whose principles and characteristics are discussed.
介绍了四甲基氢氧化铵(TMAH)溶液的腐蚀特性，论述了在单晶硅和多晶硅高温压力传感器的制作过程中，TMAH腐蚀液在浓硼终止腐蚀和各向异性硅杯腐蚀两个制作工艺中的应用。
Application of TMAH solutions which is used as etchant in boron etch-stop and anisotropic etching process in the manufacturing of single-crystal and polysilicon pressure sensors is mainly discussed.
介绍一种以多晶硅薄膜为敏感材料的压力传感器。
A polysilicon thin film pressure sensor is presented. It utilizes polysilicon thin film as stress sensitive material.
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