在前道(Front-End-of-the-Line, FEOL),诸如绝缘层和门电路层,最小线宽的变化会影响到晶体管的电学特征,如关闭电流 Ioff 和漏极饱和电流...
基于4个网页-相关网页
在前道(Front-End-of-the-Line, FEOL),诸如绝缘层和门电路层,最小线宽的变化会影响到晶体管的电学特征,如关闭电流 Ioff 和漏极饱和电流...
基于2个网页-相关网页
在我们前进的道路上 on this road we're on
在前进的道路上 On the Forward March
目前所在频道编号 ChannelIdx
在赛道中前面出现雾景 PEASOUPER
但某处在前进的道路上 But somewhere along the way
在知道你死前 BeforetheDevilKnowsYoureDead
正在知道你死前 Beforethedevilknowsyouredead
外壳必须保证涂层清晰、美观,且后续施工的涂层一定要避免覆盖在前道涂层上;
The surface for shell plate must ensure that clear, good appearance and the subsequent coats must avoid coverage on the previous coats.
化学-机械抛光(CMP) -平整和抛光晶圆片的工艺,采用化学移除和机械抛光两种方式。此工艺在前道工艺中使用。
Chemical-Mechanical % polish (CMP) - a process of flattening and polishing wafers that utilizes both chemical removal and mechanical buffing. It is used during the fabrication process.
化学-机械抛光(CMP) -平整和抛光晶圆片的工艺,采用化学移除和机械抛光两种方式。此工艺在前道工艺中使用。
Chemical-Mechanical polish (CMP) - a process of flattening and polishing wafers that utilizes both chemical removal and mechanical buffing. It is used during the fabrication process.
The six problem sets are due generally on Mondays and we'll go over the problem sets in the teaching sections, several days after you turn them in.
这六道习题通常应该在周一前完成,你们交上来之后,我们将在我的课上,讨论这几道习题
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