化学研磨 Chemical Milling ; Chemical Polishing ; chemical polishing chemical brightening ; chemical lapping
电化学研磨 electrochemical grinding ; ECG electrochemical grinding ; ECG
机械化学研磨 mechnaical-chemistry grinding
化学机械研磨 CMP ; chemical mechanical polishing ; Chemical Mechanical Planarization
化学机械研磨液 CMP Slurry
化学机械研磨技术 Chemical Mechanical Polishing ; CMP
包括化学机械研磨环 CMP ring
医生、牙医和化学家们开发出的牙粉中含有研磨牙齿的物质，如砖灰、碎瓷器、陶器和乌贼。
These powders were developed by doctors, dentists and chemists and included substances very abrasive to teeth, such as brick dust, crushed China, earthenware and cuttlefish.
分析了W - CMP的机理，抛光液对W材料表面具有化学腐蚀和机械研磨的双重作用，对抛光速率有着重要的影响。
The mechanism of W-CMP was analyzed, the slurry makes a dual function of chemical erosion and mechanical lapping, has an important influence on the polishing rate.
用于研磨、装卸、混合、搅拌、粉体输送、干燥炉、溶解炉、医药、化学、 水泥、石灰、木器、粉体涂装等作业场所。
For sites with processes such as grinding, loading unloading, mixing, stirring, particle conveyance, dry oven, dissolve tank, pharmaceutical, chemical, cement, lime, wood, powder painting.
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