化学气相沉积真空系统 CVD ; Chemical Vapor Deposition
本系统中的数字量由PLC控制，数字量主要控制真空系统、烧结炉和化学气相沉积炉中各通气管路中的开关量。
In the system the digital is controlled by PLC, digital is mainly used to control the switch data of pipeline in the vacuum system and metallurgical vessel and CVD vessel.
设计并制作了一套具有真空蒸发沉积和化学气相沉积两种薄膜制备功能的系统。
A new thin film preparation system has been devised and assembled. The system owns two kinds of thin film preparation function.
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