讨论了化学气相沉积金刚石薄膜的各种衬底材料。
In this paper, substrate materials of diamond films by chemical vapor deposition are discussed.
评述了化学气相沉积金刚石薄膜衬底表面预处理技术的进展情况。
The progress of pretreatment techniques of substrate surface for CVD diamond film was reviewed.
研究了化学气相沉积金刚石膜时甲烷浓度与金刚石膜表面粗糙度的关系。
The relationship between CH_4 concentration and the surface roughness of CVD diamond films has been studied.
应用推荐