...osited by UBMS and PVAD ,UBMS)和脉冲真空电弧沉积(Pulsed Vacuum Arc Deposition,PVAD)制备类金刚石薄膜(Diamond Like Carbon,DLC),利用泰勒霍普森表面轮廓仪,研究了不同工艺参数、不同薄膜厚度下所沉积的DLC薄膜表面粗糙度变化规律.
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...大学学报》2010年01期 ,UBMS)和脉冲真空电弧沉积(Pulsed Vacuum Arc Deposition,PVAD)制备类金刚石薄膜(DiamondLike Carbon,DLC),利用泰勒霍普森表面轮廓仪,研究了不同工艺参数、不同薄膜厚度下所沉积的DLC薄膜表面粗糙度变化规律.
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探讨了用液相电解沉积法在钛合金表面制备类金刚石薄膜的新方法。 讨论了不同沉积条件对膜的影响。
In this paper, Influence of deposition condition on diamond-like carbon(DLC) fil ms byliquid deposition onthe surface of Ti alloy was discussed.
采用真空磁过滤弧沉积(FAD)的方法制备的类金刚石(DLC)薄膜具有良好的场发射性能。
Diamond -like -carbon (DLC) thin film was prepared by filtered arc deposition (FAD) with a good electron emission performance.
本文通过实验表明采用电化学淀积法，选择合适的电解质溶液和制备工艺条件，可以在液相中获得类金刚石薄膜。
It is indicated that DLC films can be deposited in liquid phase by choosing appropriate electrolyte and preparing technology by electrodeposition method.
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