photoresist removal
光阻去除 (Resist remove)：用剥离液将完 成蚀刻之基板上的光阻去除。
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...olithography )蚀刻 ( Etching)離子植入 ( Ion implantation)光阻去除 ( Photoresist removal )光阻去除 ( Photoresist removal )扩散 ( Diffusion ) (资料來源： Chang et al.
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电浆光阻去除 Ashing ; ASHING STRIPPING
光阻去除后检查 ASI
然后再把光阻剂去除 Photoresist Scrip
去除光阻剂以后，其他机器会在蚀刻痕迹中填入各种各样的材料，如铜或铝，它们是构成处理器的组件之一。
After removing the photoresist, other machines can fill those trenches with various materials, such as copper or aluminum, that comprise the components of the processor.
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