... 光刻极限 photolithography limitation 光刻集成电路 photoetch integrated circuit 光刻技术 photoetching technique ...
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在进行大规模集成电路光刻时，采用同步辐射光源是一项新技术。
It is an new technology to use synchrotron radiation lithograph for making large scale integral circuit.
传统光学光刻技术的高成本促使科学家去开发新的非光学方法，以取代集成电路工厂目前所用的工艺。
The high cost in traditional optics lithography drives the scientists to invent new non-optical methods to replace processes currently used in IC factories.
光刻校正技术已成为超深亚微米下集成电路设计和制造中关键的技术。
The optical lithography correction techniques become key technologies in the IC designing and manufacturing of VDSM.
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