In the present work, diamond films were deposited on Co-deficient Cemented Tungsten Carbide by microwave plasma chemical vapor deposition (MPCVD).
本文采用低Co硬质合金作为金刚石薄膜的基体材料,用微波等离子体化学气相沉积法(MPCVD)沉积金刚石薄膜。
参考来源 - 低Co硬质合金上制备CVD金刚石薄膜的研究·2,447,543篇论文数据,部分数据来源于NoteExpress
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