...al stability ＞450oC)、良好的粘合强度(adhesion strength)、低吸水性（low moisture uptake）、低薄膜应力（low film stress）、高平坦化才能（planarization）、低热涨系数（coefficient of thermal expansion）以及与化学机械抛光工艺的兼容性（compatibi...
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薄膜比块体材料的应变速率低，在同样的应力下应变更加困难。
However, the strain rates in thin films are smaller than those of bulk materials, making the strain more difficult under the same stress.
本文研究了一种制备高硬度、低内应力、厚度高且热稳定性良好的非晶碳薄膜的方法。
We have developed a new process for building up thick and stable amorphous carbon films with high hardness and low internal stress.
退火使薄膜的折射率将低，释放膜层中的应力，膜层结构更加致密。
And, the annealing process release the stress of the films, which give the film a higher density.
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