优选通向存放室的气体供给部分的横截面控制粉末分配期间的气流。
Preferably, the cross section of a gas supply to the storage chamber controls the gas flow during dispensing of the powder.
本发明提供能够在处理基体上形成均匀的薄膜的微波等离子体处理装置和气体供给构件。
A microwave plasma processing device and a gas supply member capable of forming a uniform thin film on a substrate to be processed.
本发明提供一种燃烧装置，其即使在从气体阻断阀等向气体供给管路的外部发生了气体泄漏的情况下，也能够确保安全性。
To provide a combustion apparatus capable of keeping safety even if a gas leakage occurs from a gas shutoff valve to the outside of a gas supply passage.
应用推荐