... electron beam processing 电子束加工 electron beam projection 电子束投影 electron beam projector 电子枪 ...
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reducing electron beam projection system 缩小式电子束投影系统
Electron Beam Projection Lithography 投射式电子束微影术
The projection electron beam lithography with angular limitation(PEBL)is potentially one of the most attractive techniques for nano lithography in the21st Century.
具有角度限制的电子束投影曝光技术有可能成为21世纪最有潜力的纳米光刻技术之一。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
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