Therefore it is very important to analyse the emission system in electron beam device.
因此，对发射系统的分析就显得非常重要。
The device consists of magnetic field power supply, coils, and drift chamber of electron beam.
该装置由磁场电源、场线圈及电子束漂移管等组成。
Electron beam lithography machine is the key instrument for mask making and research of nanometer device.
电子束曝光技术是掩模版制作和纳米器件研究的主要手段。
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