The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.

提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。

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Essay brief a few kind methods of correcting distortion of Scan Projection Mask Alignment System.

介绍了调整扫描投影式光刻机畸变的几种方法。

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For example, Projection objects profile and appearance of the projector. The objective should be better correction distortion and like a crooked.

不同需要可选用不同的物镜，例如，投影物体轮廓和外形的投影仪，物镜应较好地矫正畸变和像场弯曲；

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