High-voltage glow-discharge ion source [分化] 高压辉光放电离子源
gas discharge ion source 气体放电离子源
arc-discharge ion source 弧放电离子源
Glow discharge ion source 辉光放电离子源
Ion source discharge 离子源放电
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
In this paper, a glow discharge plasma source ion implantation technique is described.
本文叙述了辉光放电等离子体源的等离子体源离子注入。
This article reviews the basic physics of ECR discharge and experimental research, and describes new applications of ECR plasma in surface processing, plasma coating and ion source.
本文综述了ECR放电的基本物理过程和实验研究概况，介绍了ECR等离子体在表面处理、镀膜和离子源等方面应用的最新结果。
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