Hydrogen-free diamond-like films and silicon incorporated diamond-like carbon films were deposited by direct current magnetron sputtering with Ar gas, graphite and silicon chips on the single-crystal silicon and optical glass substrates.
本文采用直流磁控溅射方法,以普通光学玻璃和单晶硅为基底,Ar为工作气体和石墨以及硅片为靶材,制备无氢类金刚石薄膜和掺硅类金刚石薄膜。
参考来源 - 掺硅类金刚石薄膜的制备、结构及光学性质Besides, the surface and roughness of aluminum films from direct current magnetron sputtering and pulse magnetron sputtering were compared.
除此之外,对直流磁控溅射和脉冲磁控溅射两种情况下得到地Al膜的表面形貌,以及粗糙度作了比较。
参考来源 - 脉冲磁控溅射法制备石英晶体谐振器的研究·2,447,543篇论文数据，部分数据来源于NoteExpress
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