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They then defined the transistor channel using electron-beam lithography, removing graphene outside of channel regions with an oxygen plasma.
然后在氧等离子体中用电子束刻蚀法去除沟道区石墨烯形成晶体管的沟道。
Inductors were defined by electron-beam lithography and formed by depositing micron-thick aluminium metal onto the wafers.
用电子束刻蚀法在晶片上镀上纳米级铝层形成了电感器。
The cut method for Gussian beam having axisymmetry is discussed in detail and the expression for the cut factor is defined in this paper.
详细推论了高斯分布的轴对称电子束的截断方法和确定截断因子的表达式。
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