DC reactive magnetron sputtering 直流反应磁控溅射
DC magnetron reactive sputtering 直流磁控反应溅射
DC diode reactive sputtering 直流二极反应溅射
dc reactive magnetron sputtering method 直流磁控溅射法
DC magnetron reactive sputtering process 直流反应磁控溅射
A novel kinetics model for dc reactive sputtering was proposed.
提出了一个新的直流反应溅动力学模型。
Through the technology of RF and DC reactive sputtering manufacture, H2S gas sensors have been developed on silicon substrate on which a heater made of Pt were attached.
通过交流和直流反应溅射，我们以硅基片（表面上有白金加热电极）为基底制作H_2S气敏元件。
TiOx thin films at the conditions of different depositing temperatures were on prepared on glass substrates by DC reactive magnetron sputtering.
通过磁控反应溅射，在玻璃基底上制备了不同溅射温度下的氧化钛薄膜。
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