Concerning producing processes of TiNi SMA. thin films, cold rolling of thin wires and DC magnetron sputtering are studied.
在TiNi形状记忆合金薄膜制备方面，研究了丝材冷轧法及直流磁控溅射法制膜工艺。
参考来源 - TiNi形状记忆合金薄膜制备工艺及其单元互联微执行器研究VOx films with high TCR are reported. The VOx filems are fabricated by DC magnetron sputtering with a highly pure vanadium metal(99.99%) as target.
讨论了在低温下以高纯金属钒作靶材,用直流磁控溅射的方法制备出了氧化钒薄膜。
参考来源 - 直流磁控溅射制备氧化钒薄膜·2,447,543篇论文数据，部分数据来源于NoteExpress
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature.
本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
The experimental condition of DC magnetron sputtering for ZMO films with good optical and electric properties has been established.
获得了直流磁控溅射法制备具有良好光电特性的ZMO薄膜的最佳工艺条件；
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