宝德采美国GT Advanced Technologies先进的hydrochlorination合成技术，以及最新化学气相沉积反应炉(CVD Reactor)，与南韩OCI多晶矽厂同步。
基于12个网页-相关网页
Using finite analytic solution we gave the numerical computation of the flow field in CVD reactor with tilted susceptor.
本文用有限分析方法，对带有倾斜基座的CVD反应器内流场进行了数值计算。
In order to modify the surface properties of the particles, composite particles are prepared by the process of Chemical Vapor Deposition (CVD) in a fluidized bed reactor.
为了对颗粒表面进行改性，在自行设计组装的流化床反应器中，利用化学气相沉积法(CVD)制备了不同的复合颗粒。
Large temperature and concentration differences taking place in CVD process lead to natural convection and concentration diffusion which interact with forced convection and complex reactor geometries.
在CVD过程中，存在着大的温度差和浓度差，将引发自然对流和浓度扩散，它们又与气体的强迫流动以及反应器的几何尺寸和形状相互影响。
应用推荐