co-sputtering system 共同溅镀系统 ; 共溅镀系统
reactive magnetron co-sputtering 磁控共溅射
Multi-Target Co-Sputtering System 多靶平行溅镀系统
magnetron co-sputtering 磁控共溅射法 ; 磁控共溅射
magnetron co sputtering 磁控共溅射
co-sputtering deposition 共溅射沉积
DC magnetron co-sputtering 直流磁控共溅射
reactive rf magnetic co-sputtering 射频磁控反应溅射
Ge doped ZnO thin films were grown by co-sputtering method, and substrate temperature influence on the structure, composition, morphology and photoluminescence of films was studied.
一、使用共溅射法沉积Ge掺杂的ZnO薄膜，研究了基片温度对薄膜的结构与成分、表面形貌以及光致发光性能的影响。
参考来源 - Ge掺杂对ZnO薄膜结构和光学特性的影响·2,447,543篇论文数据，部分数据来源于NoteExpress
The rich rare earth transition metal amorphous films were prepared by DC double target co sputtering method.
用直流共溅射方法制备了富稀土-过渡族金属非晶态合金薄膜。
Diamond-like carbon DLC thin films were deposited onto si 100 and high speed steel substrates by mid-frequency magnetron sputtering system SP0806AS, Beijing Power tech Co.
采用SP0806AS中频磁控溅射镀膜机，在硅(100)和高速钢基体上，采用双石墨靶在不同功率下沉积了类金刚石薄膜。
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