... Chemical Vapor Infiltration: (CVI)化学汽相渗透, 化学汽相渗入 chemically amplified: 化学增强的 chemically amplified resist: 抗化学腐蚀性,抗化学蚀刻能力,增强型化学保护层 ...
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chemically-amplified resist 抗化学腐蚀性 ; 抗化学蚀刻能力
chemically amplified resist 化学放大型抗蚀剂 ; 药剂切割
non-Chemically Amplified 非化学增幅
·2,447,543篇论文数据，部分数据来源于NoteExpress
Therefore, novel models for thick chemically amplified photoresist which fit well characters of SU-8 resist is set up.
因而这篇文章包括了我们在厚的化学放大胶光刻模型方面的努力，这些新的模型适用于SU-8胶。
The invention further provides a chemically amplified positive resist composition comprising the salt represented by the formula (I).
本发明还提供含有由上述式（I） 表示的盐的化学放大型抗蚀剂组合物。
The models are based on usual simulation models for chemically amplified photoresist added with swell model and the model for depth - dependent dissolution rate effect.
这个模型在普通的化学放大胶光刻模拟的基础上，添加了溶胀模型和对显影速率随深度变化效应的模拟。
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