...ur deposition 化学蒸汽沉积 ; 化学蒸馏 ; 的化学气相沉积 ; 和化学气相沉积法 chemical vapor deposition film 化学汽相淀积膜 oxidative chemical vapor deposition 氧化化学气相淀积 ..
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A novel passivation technology of porous silicon (PS) surface, i. e. , depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed.
提出了一种新颖的多孔硅表面钝化技术，即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。
The article has introduced the application and development tendency of techniques of film making with chemical vapor deposition in all fields.
本文介绍了化学气相沉积制膜技术在国民经济各个领域中的应用及其发展趋势。
The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.
研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中，热阴极辉光放电特性与金刚石膜沉积工艺的关系。
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