...；变化；过渡，经过，渡越；渐变段，过渡段；临界点，转折点；转换过程 chemical vapor deposition equipment 化学气相淀积设备 chemical vapor deposition method 化学气相淀积工艺 ..
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希高翻译-物理专业词汇中英对照四 ... chemical vapor deposition (cvd) 化学汽相淀积 chemical vapor deposition (CVD) equipment 化学气相沉积法设备( CVD) chemical vapor phase oxidation process 化学汽相氧化法 ...
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MOCVD stands for Metalorganic Chemical Vapor Deposition, is one technology used to grow wafers from underlay with the MOCVD equipment.
MOCVD是金属有机化学气相沉积技术的简称，即通过MOCVD设备，在衬底上生长材料晶体的一种方法。
In this study we designed and made the preparation equipment of nano-silicon powder by LICVD (laser induced chemical vapor deposition), and introduced the designing thought of key parts.
本研究自行设计制作了激光诱导化学气相沉积(LICVD)纳米硅粉制备设备，并对关键部件的设计思路进行了阐述。
Diamond thin films were successfully deposited on single - crystal si substrate at low pressure by a homemade equipment of electron cyclotron resonance chemical vapor deposition (ECRCVD).
采用国内研制的电子回旋共振化学气相沉积(ECRCVD)设备，在单晶硅衬底上沉积了金刚石薄膜。
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