In this study we designed and made the preparation equipment of nano-silicon powder by LICVD (laser induced chemical vapor deposition), and introduced the designing thought of key parts.
本研究自行设计制作了激光诱导化学气相沉积(LICVD)纳米硅粉制备设备，并对关键部件的设计思路进行了阐述。
This open-type wet process equipment is used to clean substrates and parts by chemical spraying and soaking.
本设备为开放式清洗机，具有喷淋、浸泡功能，用于半导体工业硅片及零部件的清洗。
Aircraft pump parts, aircraft fittings, nuclear energy installation, food equipment, chemical equipment, Marine parts.
飞机配件、食物器皿、核能装置、船舶配件。
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