Compared with a chemical doping, the plasma doping displays much higher doping speed and can improve the stability of conductive polymers.
与化学掺杂相比较，等离子体掺杂具有很高的掺杂速率，并可提高导电聚合物的稳定性。
Platinum doping is need before nickel chemical plating for FR rectifiers.
快恢复二极管需要在化学镀镍前扩铂。
Phosphine (PH3) is an important electronic specific gas which is mainly used in fields of N-type semiconductor doping, ion implement and chemical vapor deposition (CVD) etc.
磷化氢(PH3)是一种重要的电子特气，主要用于n型半导体的掺杂、离子注入和化学气相沉积(CVD)等。
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