In the condition of big current and high concentration of carbon particles, masses of curled MWCNTs were obtained on the surface of the cathode deposition.
在电弧电流较大，碳粒子浓度较高的情况下，可以在阴极表面生成大量弯曲的多壁碳纳米管。
Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.
大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜，有效地提高了沉积速率和膜品质。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
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