5.Thereafter, by using this mask, the resist film on the wafer is EB-exposed without proximity effect correction.
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By using linear mask and the optimal fusion estimation, this algorithm improves the ability of edge keeping and denoising effectively, overcomes the disadvantages of the edge keeping filter.
该算法釆用线状掩模窗口和最优融合估计方法,有效地增强了边缘保持能力和去噪能力,克服了边缘保持滤波器存在的缺陷。
On this basis a new method for fabricating polyimide ridge waveguides by photobleaching technique and using metal mask is proposed.
并在此基础上,提出了以金属掩模,利用光漂白技术制备聚酰亚胺脊型光波导的新方法。
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