...h etch)与软性着陆蚀刻(soft landing etch)，蚀穿及软性着陆蚀刻是使用不同蚀刻气体、功率(source power)及偏压功率(bias power)、压力、气流速率及时间来执行，阶梯式蚀刻会产生平滑而不具有陡峭台阶(abrupt steps)的多晶硅表面。
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PA-BIAS Power Amplifier Bias 功放偏压
lcd bias power supply lcd偏置电源
grid bias power supply [电子] 偏压电源
Bias power matching box 偏置功率匹配器
bias-power-margin 偏压功率范围
bias power supply 偏置电源
dc bias power supply 直流偏压
pulse-bias power supply 脉冲偏压电源
pulsed bias power supply 脉冲偏压电源
Therefore, plasma etching anisotropy can be improved by increasing rf frequency or rf-bias power.
因此，等离子体刻蚀的各向异性可以通过增加射频频率和射频功率来改善。
The effect of base bias resistors on the parameters of pa (power amplifier) was simulated.
模拟了基极偏置电阻对功率放大器参数的影响。
Agnew had told some home truths about their power and bias.
关于他们的权力和偏见，阿格纽说过一些击中要害的大实话。
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